Plenary and Invited Speakers
Speaker information will be updated as it becomes available.
Plenary Speakers
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Tsunenobu Kimoto Kyoto Univ., JapanCrossing the Chasm: SiC Semiconductor Technology in the Era of Transformation -
Hajime Shoji Sumitomo Electric, JapanDriving the evolution of connected world with compound semiconducutor devices -
Huili Grace Xing Cornell Univ., USAIntroducing AlN XHEMT - a New Kid on the Block -
Lars Zimmermann IHP GmbH/Technische Universität Berlin, GermanySilicon germanium photonics – a fresh view on electronic photonic convergence
Invited Speakers
Scope A: Epitaxy and process technologies
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• Erik Bakkers Eindhoven Univ. of Technology, NetherlandsEpitaxy of Direct Band Gap Hexagonal SiGe
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• Davide Colucci imec, BelgiumNew laser device concepts in Silicon photonics enabled by Nano-Ridge Engineering
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• Yu Han Sun Yet-San Univ., ChinaMonolithic Integration of III-V Lasers on SOI using Selective Lateral Heteroepitaxy
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• Di Liang Univ. of Michigan, USAElectrically-Driven Ultraviolet Distributed Feedback Lasers
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• Huiyun Liu Univ. College London, UKInAs/InAlGaAs quantum dot laser on InP and Si substrates
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• Shinya Yamada Osaka Univ., JapanEpitaxial half-metallic Heusler alloy/III-V compound semiconductor heterostructures for semiconductor spintronic devices
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• Teruo Jyo NTT, JapanWideband 300-GHz InP DHBT Power Amplifier Achieving 280-Gb/s Signal Generation with Digital Predistortion
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• Viktor Krozer Goethe Universität Frankfurt/Main / Ferdinand-Braun-Institut, GermanyTowards Terahertz Bandwidth Heterogeneous Integration of Semiconductor Technologies
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• Keigo Nakatani Mitsubishi Electric, JapanA W-band 1 W-class GaN MMIC Power Amplifier for Beyond 5G
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• Junya Yaita Sumitomo Electric Industries, Ltd., JapanExperimental Verification of the Advantages of N-polarGaN HEMTs Compared to Ga-polar HEMTs
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• Andrew Binder Sandia, USAAdvances and Integration Strategies for High-k Gate Dielectrics in GaN and SiC Power Devices
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• Masahiro Horita Nagoya Univ., JapanStudy on intrinsic point defects in GaN formed by electron beam irradiation
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• Motoki Kobayashi Sumitomo Metal Mining, Japan4H-SiC bonded substrate “SiCkrest™” and its application to power devices
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• Julien Pernot Université Grenoble Alpes, FranceRecent progress of diamond field effect transistor
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• Akio Takatsuka Novel Crystal Technology, JapanRecent Progress of β-Ga2O3 Trench Implemented Vertical Schottky Diodes
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• Xin Chen Huawei Technologies R&D, Ltd, China
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• Paul Crump Ferdinand-Braun-Institut, GermanyHigh-power diode lasers for fusion energy applications: perspectives from research and industry
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• Nikolaos-Padeleimon Diamantopoulos NTT, JapanHigh-Speed, Low-Energy Membrane Feedback Lasers for AI Applications
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• Tatsushi Hamaguchi Kyushu Univ., Japan
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• Akihiko Kikuchi Sophia Univ., Japan
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• Naoya Morioka Kyoto Univ., JapanPhotoelectrical Readout and Characterization of Defect Spins in Silicon Carbide for Quantum Applications
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• Kunal Mukherjee Stanford Univ., USA
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• Szymon Stanczyk Institute of High Pressure Physics of the Polish Academy of Sciences, PolandRecent Progress and Novel Approaches of InGaN Laser Diodes and Superluminescent Diodes
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• Kenichi Tanigawa Oki Electric Industry Co., Ltd., Japan
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• Marc Bescond CNRS, France Cooling at the Nanoscale with Quantum HeterostructuresCooling at the Nanoscale with Quantum Heterostructures
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• Makoto Kohda Tohoku Univ., JapanControl of Spin Helix in Semiconductor heterostructures -Towards Multiplexed and Parallel information processing-
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• Takao Mori CNIMS, JapanUtilizing defect engineering and magnetism to realise high performance thermoelectric materials & devices
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• Jorge Puebla Kyoto Univ., JapanStrong magnon-phonon coupling and nonlinear magnetoelastic waves excitations
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• Haidong Wang Tsinghua Univ., China
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• Sanghoon Chae Nanyang Technological Univ., SingaporeElectrically Tunable Nonlinear Optic Response in Ferroelectric NbOBr2 Integrated Photonics
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• Moon-Ho Jo Pohang Univ. of Science and Technology (POSTECH), South Korea
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• Chun-Liang Lin National Yang Ming Chiao Tung Univ. (NYCU), TaiwanProperty at Interfaces of Contact Metals and Monolayer 2D Semiconductor
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• Shinpei Ogawa Mitsubishi Electric Corp., JapanGraphene Image Sensors Based on Photogated Diodes
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• Kento Sasaki The Univ. of Tokyo, JapanDetection and control of the spins in hexagonal boron nitride
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• Zbigniew Galazka Section Oxides & Fluorides, Leibniz-Institut für Kristallzüchtung, GermanyBulk rutile-GeO2 single crystals, epi-ready wafers, and physical properties – a comparison with -Ga2O3 and -(AlxGa1-x)2O3 single crystals
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• Junghwa Kim UNIST, South Korea
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• Masaharu Kobayashi The Univ. of Tokyo, Japan4H-SiC bonded substrate “SiCkrest TM” and its application to power devices
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• Rachana Acharya Univ. of Cambridge, UK Organic transistors: From thin films to electrochemical to bioelectronicOrganic transistors: From thin films to electrochemical to bioelectronic
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• Jun Takeya The Univ. of Tokyo, Japan
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• Wonryeol Yang Pohang Univ. of Science and Technology, South KoreaDevelopment of High-Performance P-type Semiconductors for Transistors
Scope B: RF and THz devices
Scope C: Power devices
Scope D: Photonic devices and related technologies
Scope E: Physics, spintronics, and novel device concepts
Scope F: Low dimensional materials and structures
Scope G: Oxide materials and devices
Scope H: Flexible materials